Design for Manufacturability with Advanced Lithography
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.Enables readers to tackle the challenge of layout dec…
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Produktdetails
Weitere Autoren: Yu, Bei
- ISBN: 978-3-319-37393-5
- EAN: 9783319373935
- Produktnummer: 25581164
- Verlag: Springer International Publishing
- Sprache: Englisch
- Erscheinungsjahr: 2016
- Seitenangabe: 176 S.
- Masse: H23.5 cm x B15.5 cm x D0.9 cm 277 g
- Auflage: Softcover reprint of the original 1st ed. 2016
- Abbildungen: Paperback
- Gewicht: 277
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