Extreme Ultraviolet Lithography
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.Master Extreme Ultraviolet Lithography TechniquesProduce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and min…
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Produktdetails
Weitere Autoren: Kumar, Ajay
- ISBN: 978-0-07-154918-9
- EAN: 9780071549189
- Produktnummer: 4156814
- Verlag: Mcgraw Hill Book Co
- Sprache: Englisch
- Erscheinungsjahr: 2009
- Seitenangabe: 465 S.
- Masse: H23.1 cm x B15.5 cm x D3.0 cm 757 g
- Gewicht: 757
Über den Autor
Banqiu Wu, Ph.D., is Chief Technology Officer, Mask Products Division, Applied Materials, Inc.Ajay Kumar, Ph.D., is General Manager, Cleans and Mask Products Business Group, Applied Materials, Inc.
3 weitere Werke von Banqiu Wu:
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