Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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Produktdetails
Weitere Autoren: Dasgupta, Sudeb / Pal, Pankaj Kumar
- ISBN: 978-1-4987-8359-0
- EAN: 9781498783590
- Produktnummer: 22804759
- Verlag: Taylor and Francis
- Sprache: Englisch
- Erscheinungsjahr: 2017
- Seitenangabe: 154 S.
- Masse: H23.4 cm x B15.6 cm x D1.6 cm 378 g
- Abbildungen: Farb., s/w. Abb.
- Gewicht: 378
Über den Autor
152393586
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