Photomask Fabrication Technology
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.>Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technol…
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Produktdetails
Weitere Autoren: Wu, Banqiu
- ISBN: 978-0-07-144563-4
- EAN: 9780071445634
- Produktnummer: 1669757
- Verlag: McGraw-Hill Education - Europe
- Sprache: Englisch
- Erscheinungsjahr: 2005
- Seitenangabe: 500 S.
- Masse: H23.1 cm x B15.2 cm x D4.5 cm 917 g
- Abbildungen: 150 Illustrations, unspecified
- Gewicht: 917
- Sonstiges: Tertiary Education (US: College)
Über den Autor
Benjamin G. Eynon, Jr. (Austin, TX) is currently Director of Advanced Technology Development at Photronics, Inc. He has over 18 years of experience in the semiconductor industry in technology development and manufacturing. He sits on a number of international professional conferences committees, and is a reviewer of peer-reviewed technology journal articles. He holds two US patents and has over 25 professional publications.
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