Ion Implantation in Semiconductors and Other Materials
During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area. The advances in this field were so rapid that a second conference convened at Garmisch Partenkirchen, Germany, in 1971. At the present time, our under standing of the ion implantation process in semiconductors such as Si and Ge has reached a stage of maturity and ion implantation techniques are firmly established in semiconductor device technology. The advances in compound semiconductors have not been as rapid. There has also been a shift in emphasis in ion implanta ti…
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Produktdetails
- ISBN: 978-1-4684-2066-1
- EAN: 9781468420661
- Produktnummer: 15470639
- Verlag: Springer Us
- Sprache: Englisch
- Erscheinungsjahr: 2012
- Seitenangabe: 672 S.
- Masse: H24.4 cm x B17.0 cm x D3.5 cm 1'140 g
- Auflage: Softcover reprint of the original 1st ed. 1973
- Abbildungen: Paperback
- Gewicht: 1140
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